Y2O3 thermal spray powder is a plasma etching-resistant material for semiconductor industrial wafer processing equipment. It can avoid the corrosion of high-energy fluorine plasma on the components in the chamber during plasma etching. In addition, It can also avoid the deposition of volatile fluoride generated during the etching process on the wafer surface. Ultimately, the component's service life is increased, and the wafer contamination is reduced. Grirem Advanced Materials Co., Ltd. can supply high-purity Y2O3 granulation powder with various particle sizes according to customized requirements.